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Performance evaluation of finFET based SRAM under statistical VT variability

  • American University in Cairo
  • Cairo University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

6 Scopus citations

Abstract

FinFET devices are the most promising solutions for further technology scaling in the long term projections of the ITRS. The performance of extremely scaled FinFET-based 256-bit (6T) SRAM is evaluated with technology scaling for channel lengths of 20nm down to 7nm showing the scaling trends of basic performance metrics. In addition, the impact of threshold voltage variations on the delay, power, and stability is reported considering die-to-die variations. Significant performance degradation is found starting from the 10nm channel length and continues down to 7nm.

Original languageEnglish
Title of host publication2014 26th International Conference on Microelectronics, ICM 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages88-91
Number of pages4
ISBN (Electronic)9781479981533
DOIs
StatePublished - 2014
Externally publishedYes
Event2014 26th International Conference on Microelectronics, ICM 2014 - Doha, Qatar
Duration: 14 Dec 201417 Dec 2014

Publication series

NameProceedings of the International Conference on Microelectronics, ICM
Volume2015-March

Conference

Conference2014 26th International Conference on Microelectronics, ICM 2014
Country/TerritoryQatar
CityDoha
Period14/12/1417/12/14

Keywords

  • 6T SRAM
  • Nano-scale FinFET
  • Technology scaling
  • threshold voltage variations

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