Skip to main navigation Skip to search Skip to main content

Noise in SOI MOSFETs and gate-all around transistors

  • B. Iñiguez
  • , A. Lázaro
  • , H. A. Hamid
  • , G. Pailloncy
  • , G. Dambrine
  • , F. Danneville
  • Universidad Rovira i Virgili
  • IEMN CNRS UMR 8520

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

In this paper, we discuss the RF noise properties of SOI MOSFETs, and we present a suitable model for nanoscale fully-depleted SOI MOSFETs, which is derived from a compact quasi-static SOI MOSFET model by properly extending it to the high frequency regime, using the active line approach and taking into account all the extrinsic parameters. We have used a physically-based noise modeling which takes account diffusion related fluctuations; this allows to study fundamental noise parameters close to the current noise sources and to discuss the downscaling of these noise sources. Finally, we have extended our study to Double-Gate devices, using as a basis a quasi-static model recently presented.

Original languageEnglish
Title of host publicationNOISE AND FLUCTUATIONS
Subtitle of host publication18th International Conference on Noise and Fluctuations - ICNF 2005
Pages269-274
Number of pages6
DOIs
StatePublished - 25 Aug 2005
Externally publishedYes
EventNOISE AND FLUCTUATIONS: 18th International Conference on Noise and Fluctuations - ICNF 2005 - Salamanca, Spain
Duration: 19 Sep 200523 Sep 2005

Publication series

NameAIP Conference Proceedings
Volume780
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Conference

ConferenceNOISE AND FLUCTUATIONS: 18th International Conference on Noise and Fluctuations - ICNF 2005
Country/TerritorySpain
CitySalamanca
Period19/09/0523/09/05

Keywords

  • Compact noise modeling
  • Double-Gate MOSFETs
  • High-frequency operation
  • SOI MOSFETs

Fingerprint

Dive into the research topics of 'Noise in SOI MOSFETs and gate-all around transistors'. Together they form a unique fingerprint.

Cite this