Electron beam decomposition of CdCl2

Mino Green; C. J. Aidinis; O. A. Fakolujo

doi:10.1063/1.334754

Electron beam decomposition of CdCl₂

Mino Green
, C. J. Aidinis
, O. A. Fakolujo

Imperial College London

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

The e-beam stimulated reaction, CdCl₂ (s)→Cd(s)+2 Cl(g), has been studied in cadmium chloride thin films between 303 and 483 K using 2-keV electrons. The dose required to make 90-nm-deep holes at 483 K is 3×10^-3 C cm^-2. Extrapolated dosing levels of ∼6×10^-5 C cm^- ² are expected. The use of CdCl₂ as a positive-type electron resist in a new scheme is proposed. A working model, useful for considering the e-beam stimulated decomposition energetics and mechanism, is briefly discussed.

Original language	English
Pages (from-to)	631-633
Number of pages	3
Journal	Journal of Applied Physics
Volume	57
Issue number	2
DOIs	https://doi.org/10.1063/1.334754
State	Published - 1985
Externally published	Yes

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title = "Electron beam decomposition of CdCl2",

abstract = "The e-beam stimulated reaction, CdCl2 (s)→Cd(s)+2 Cl(g), has been studied in cadmium chloride thin films between 303 and 483 K using 2-keV electrons. The dose required to make 90-nm-deep holes at 483 K is 3×10-3 C cm-2. Extrapolated dosing levels of ∼6×10-5 C cm- 2 are expected. The use of CdCl2 as a positive-type electron resist in a new scheme is proposed. A working model, useful for considering the e-beam stimulated decomposition energetics and mechanism, is briefly discussed.",

author = "Mino Green and Aidinis, \{C. J.\} and Fakolujo, \{O. A.\}",

year = "1985",

doi = "10.1063/1.334754",

language = "English",

volume = "57",

pages = "631--633",

journal = "Journal of Applied Physics",

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publisher = "American Institute of Physics",

number = "2",

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T1 - Electron beam decomposition of CdCl2

AU - Green, Mino

AU - Aidinis, C. J.

AU - Fakolujo, O. A.

PY - 1985

Y1 - 1985

N2 - The e-beam stimulated reaction, CdCl2 (s)→Cd(s)+2 Cl(g), has been studied in cadmium chloride thin films between 303 and 483 K using 2-keV electrons. The dose required to make 90-nm-deep holes at 483 K is 3×10-3 C cm-2. Extrapolated dosing levels of ∼6×10-5 C cm- 2 are expected. The use of CdCl2 as a positive-type electron resist in a new scheme is proposed. A working model, useful for considering the e-beam stimulated decomposition energetics and mechanism, is briefly discussed.

AB - The e-beam stimulated reaction, CdCl2 (s)→Cd(s)+2 Cl(g), has been studied in cadmium chloride thin films between 303 and 483 K using 2-keV electrons. The dose required to make 90-nm-deep holes at 483 K is 3×10-3 C cm-2. Extrapolated dosing levels of ∼6×10-5 C cm- 2 are expected. The use of CdCl2 as a positive-type electron resist in a new scheme is proposed. A working model, useful for considering the e-beam stimulated decomposition energetics and mechanism, is briefly discussed.

UR - https://www.scopus.com/pages/publications/4944231322

U2 - 10.1063/1.334754

DO - 10.1063/1.334754

M3 - Article

AN - SCOPUS:4944231322

SN - 0021-8979

VL - 57

SP - 631

EP - 633

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 2

ER -

Electron beam decomposition of CdCl₂

Abstract

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