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Determination and analysis of dispersive optical constant of TiO 2 and Ti 2 O 3 thin films

  • M. M. Abdel-Aziz
  • , I. S. Yahia
  • , L. A. Wahab
  • , M. Fadel
  • , M. A. Afifi
  • Ain Shams University
  • Egyptian Atomic Energy Authority

Research output: Contribution to journalArticlepeer-review

123 Scopus citations

Abstract

Electron beam evaporation technique was used to prepare TiO 2 and Ti 2 O 3 thin films onto glass substrates of thicknesses 50, 500 and 1000 nm for each sample. The structural investigations revealed that the as-deposited films are amorphous in nature. Transmittance measurements in the wavelength range (350-2000 nm) were used to calculate the refractive index n and the absorption index k using Swanepoel's method. The optical constants such as optical band gap E g opt , optical conductivity σ opt , complex dielectric constant, relaxation time τ and dissipation factor tan δ were determined. The analysis of the optical absorption data revealed that the optical band gap E g was indirect transitions. The optical dispersion parameters E o and E d were determined according to Wemple and Didomenico method.

Original languageEnglish
Pages (from-to)8163-8170
Number of pages8
JournalApplied Surface Science
Volume252
Issue number23
DOIs
StatePublished - 30 Sep 2006
Externally publishedYes

Keywords

  • Dielectric constant
  • Optical dispersion parameters
  • Titanium oxides

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