A new strategy: A more valid determination of the nonlinear optical parameters for optoelectronic applications

This work is an attempt to discuss and suggest a new semiempirical approach, which may help in determining the nonlinear optical parameters based on the value of the linear refractive index. The widely used of the approximated equations of H. Ticha and L. Tichy was used as a primary step for the estimation of the new approach. The approximation of H. Ticha and L. Tichy has been reviewed and then given a mathematical derivation. The derivation process resulted in H. Ticha and L. Tichy’s relation is valid in the determination of the nonlinear optical parameters, nonlinear refractive index n₂ and third-order optical susceptibility χ⁽³⁾, only at the lower energies and higher wavelengths. A new novel approximation has been obtained by employing the fundamental concepts of numerical modulation as well as the simulation principles. The new approximation relates the nonlinear optical parameters; nonlinear refractive index n₂ and third-order optical susceptibility χ⁽³⁾, to the linear refractive index n_o. The new method successfully simulates and matches experimental data at the lower and higher energy levels with high resolution. Of course, the obtained method does not replace the experimental one, but it may be useful when the experimental techniques are not available. Also, the obtained equations may be used to simulate the experimentally measured data. Finally, the resulting equations may be a kind of basis for the future modeling of nonlinear optical behavior of materials.